Plasma Enhanced Chemical Vapor Deposition System (PE-CVD) | Located at 237, Physics Building

The PE-CVD system contains one tube furnce (1 inch, up to 1200 C, MIT from KJMT), four mass flow meters (Sevenstar), one vacuum pump, one full range gauge, and one plasma source (300W, K-mate). It can be used for the growth of different kinds of two dimensional materials, especially graphene.